Characterization of Vegard strain related to exceptionally fast Cu-chemical diffusion in Cu2Mo6S8 by an advanced electrochemical strain microscopy method

Badur, SebastianSebastianBadurRenz, DiemoDiemoRenzCronau, MarvinMarvinCronauGöddenhenrich, ThomasThomasGöddenhenrichDietzel, DirkDirkDietzelRoling, BernhardBernhardRolingSchirmeisen, AndréAndréSchirmeisen2022-08-262022-08-262021https://jlupub.ub.uni-giessen.de/handle/jlupub/7032http://dx.doi.org/10.22029/jlupub-6483enNamensnennung 4.0 Internationalddc:530Characterization of Vegard strain related to exceptionally fast Cu-chemical diffusion in Cu2Mo6S8 by an advanced electrochemical strain microscopy method