The band alignment of Cu2O/ZnO and Cu2O/GaN heterostructures

dc.contributor.authorKramm, B.
dc.contributor.authorLaufer, A.
dc.contributor.authorReppin, D.
dc.contributor.authorKronenberger, A.
dc.contributor.authorHering, P.
dc.contributor.authorPolity, A.
dc.contributor.authorMeyer, B. K.
dc.date.accessioned2023-06-02T13:37:45Z
dc.date.available2015-07-17T09:52:20Z
dc.date.available2023-06-02T13:37:45Z
dc.date.issued2012
dc.description.abstractUsing photoelectron spectroscopy, we investigate the band alignments of the Cu2O/ZnO heterointerface and compare the findings with the corresponding values for Cu2O/GaN. While for Cu2O/ZnO, we find a valence band offset (VBO) of 2.17 eV and a conduction band offset (CBO) of 0.97 eV, both values are considerably reduced for Cu2O/GaN where the numbers are 1.47 eV (VBO) and 0.24 eV (CBO), respectively. The large CBO between ZnO and Cu2O will very likely result in low photovoltaic power conversion efficiencies as is the current status of Cu2O/ZnO solar cells.en
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:hebis:26-opus-98899
dc.identifier.urihttps://jlupub.ub.uni-giessen.de//handle/jlupub/16403
dc.identifier.urihttp://dx.doi.org/10.22029/jlupub-15783
dc.language.isoende_DE
dc.rightsIn Copyright*
dc.rights.urihttp://rightsstatements.org/page/InC/1.0/*
dc.subject.ddcddc:530de_DE
dc.titleThe band alignment of Cu2O/ZnO and Cu2O/GaN heterostructuresen
dc.typearticlede_DE
local.affiliationFB 07 - Mathematik und Informatik, Physik, Geographiede_DE
local.commentDieser Beitrag ist mit Zustimmung des Rechteinhabers aufgrund einer (DFG geförderten) Allianz- bzw. Nationallizenz frei zugänglich. This publication is with permission of the rights owner freely accessible due to an Alliance licence and a national licence (funded by the DFG, German Research Foundation) respectively.
local.opus.fachgebietPhysikde_DE
local.opus.id9889
local.opus.institute1. Physikalisches Institutde_DE
local.source.freetextApplied Physics Letters 100(9):094102 doi:10.1063/1.3685719de_DE
local.source.urihttps://doi.org/10.1063/1.3685719

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