Ultrathin Al2O3 Protective Layer to Stabilize the Electrochromic Switching Performance of Amorphous WOx Thin Films

dc.contributor.authorGies, Mario
dc.contributor.authorBenz, Sebastian L.
dc.contributor.authorPradja, Mark M.
dc.contributor.authorSchlettwein, Derck
dc.contributor.authorChatterjee, Sangam
dc.contributor.authorBecker, Martin
dc.contributor.authorPolity, Angelika
dc.date.accessioned2023-09-25T14:26:51Z
dc.date.available2023-09-25T14:26:51Z
dc.date.issued2023
dc.description.abstractElectrochromic materials play a key role in smart windows, displays or anti-glare rear-view mirrors. Tungsten oxide is an intensely studied representative due to its extraordinary coloring performance. For commercial use, however, further optimization of the general cycle stability as well as the protection against external factors, such as moisture, is a still ongoing focus of research. In this study, the stabilization of the electrochromic switching performance of tungsten oxide is investigated using an ultrathin optimized Al2O3 protective coating, grown by atomic layer deposition. Amorphous tungsten oxide (a-WOx) thin films are prepared by reactive radio-frequency sputtering. The composition as well as electronic structure of the pure a-WOx films is studied by X-ray photoelectron spectroscopy. The electrochromic properties of the multilayer system are investigated in a nonaqueous electrolyte as well as in an electrolyte containing 10 vol% water. On the basis of these results, the stabilizing effect on the electrochromic switching characteristics of a-WOx by the use of the additional thin Al2O3 protective layer is evident. It is shown that degradation and ageing of a-WOx due to moisture can be prevented and coloration efficiencies of 50.4 cm2 C−1 can be achieved at 630 nm.
dc.description.sponsorshipDeutsche Forschungsgemeinschaft (DFG); ROR-ID:018mejw64
dc.identifier.urihttps://jlupub.ub.uni-giessen.de//handle/jlupub/18532
dc.identifier.urihttp://dx.doi.org/10.22029/jlupub-17896
dc.language.isoen
dc.rightsNamensnennung 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subjectatomic layer deposition
dc.subjectelectrochromic device
dc.subjectprotective layer
dc.subjectradiofrequency magnetron sputtering
dc.subjecttungsten oxide
dc.subjectX-ray photoelectron spectroscopy
dc.subject.ddcddc:530
dc.titleUltrathin Al2O3 Protective Layer to Stabilize the Electrochromic Switching Performance of Amorphous WOx Thin Films
dc.typearticle
local.affiliationFB 07 - Mathematik und Informatik, Physik, Geographie
local.projectRTG (Research Training Group) 2204 "Substitute Materials for Sustainable Energy Technologies."
local.source.articlenumber2202422
local.source.epage10
local.source.journaltitleAdvanced materials interfaces
local.source.spage1
local.source.urihttps://doi.org/10.1002/admi.202202422
local.source.volume10

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