Plasma electrochemical growth of ion-conducting AgBr and AgCl

dc.contributor.authorVennekamp, M.
dc.contributor.authorJanek, Jürgen
dc.date.accessioned2023-06-12T07:53:54Z
dc.date.available2005-09-14T09:13:08Z
dc.date.available2023-06-12T07:53:54Z
dc.date.issued2001
dc.description.abstractThe electrochemically controlled anodic growth of binary cation-conducting layers in reactive low temperature plasmas is studied (model systems: AgCl and AgBr). A formal stability criterion comparing the electric field within the film and the plasma is derived. It predicts either morphologically stable or unstable growth depending on the reaction temperature. The experiments prove this stability criterion qualitatively. The experimental setup and results of our plasma electrochemical growth experiments are presented. The idea to utilize low temperature plasmas as fluid mixed conductors is discussed.en
dc.identifier.urihttp://nbn-resolving.de/urn:nbn:de:hebis:26-opus-23827
dc.identifier.urihttps://jlupub.ub.uni-giessen.de//handle/jlupub/16726
dc.identifier.urihttp://dx.doi.org/10.22029/jlupub-16104
dc.language.isoende_DE
dc.rightsIn Copyright*
dc.rights.urihttp://rightsstatements.org/page/InC/1.0/*
dc.subjectPlasmaen
dc.subjectSolid electrolyteen
dc.subjectInterfacesen
dc.subjectMorphologyen
dc.subjectMetal oxidationen
dc.subject.ddcddc:540de_DE
dc.titlePlasma electrochemical growth of ion-conducting AgBr and AgClen
dc.typearticlede_DE
local.affiliationFB 08 - Biologie und Chemiede_DE
local.opus.fachgebietChemiede_DE
local.opus.id2382
local.opus.institutePhysikalisch-Chemisches Institutde_DE
local.source.freetextZuerst erschienen in: Solid State Ionics 141/142 (2001) 71-80: http://dx.doi.org/10.1016/S0167-2738(01)00723-8de_DE

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