Characterization of Vegard strain related to exceptionally fast Cu-chemical diffusion in Cu2Mo6S8 by an advanced electrochemical strain microscopy method

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dc.contributor.authorBadur, Sebastian
dc.contributor.authorRenz, Diemo
dc.contributor.authorCronau, Marvin
dc.contributor.authorGöddenhenrich, Thomas
dc.contributor.authorDietzel, Dirk
dc.contributor.authorRoling, Bernhard
dc.contributor.authorSchirmeisen, André
dc.date.accessioned2022-08-26T14:08:01Z
dc.date.available2022-08-26T14:08:01Z
dc.date.issued2021
dc.identifier.urihttps://jlupub.ub.uni-giessen.de//handle/jlupub/7032
dc.identifier.urihttp://dx.doi.org/10.22029/jlupub-6483
dc.language.isoen
dc.rightsNamensnennung 4.0 International
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subject.ddcddc:530
dc.titleCharacterization of Vegard strain related to exceptionally fast Cu-chemical diffusion in Cu2Mo6S8 by an advanced electrochemical strain microscopy method
dc.typearticle
local.affiliationFB 07 - Mathematik und Informatik, Physik, Geographie
local.source.articlenumber18133
local.source.epage8
local.source.journaltitleScientific reports
local.source.spage1
local.source.urihttps://doi.org/10.1038/s41598-021-96602-2
local.source.volume11

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